Compound, radiation-sensitive composition and resist pattern formation method

A positive type radiation-sensitive composition comprising a compound (B), an acid generator (D) generating acid directly or indirectly by irradiation of any radiation selected from the group consisting of visible light, ultraviolet light, excimer laser, electron beam, extreme ultraviolet light (EUV), X-ray and ion beam, an acid diffusion controller (E), and a solvent,

• wherein the compound (B) is obtained by reaction between a polyphenol based cyclic compound (A) represented by the following formula (1-2) and a compound (C) represented by the following formula (3):
• (In the formula (1), R1 is independently an alkyl group of 1 to 20 carbons, or a group represented by the following formula (2),
• wherein, R2 is independently a functional group selected from the group consisting of a hydrogen atom, a cycloalkyl group of 3 to 20 carbons, an aryl group of 6 to 20 carbons, an alkoxy group of 1 to 20 carbons, a hydroxyl group, a cyano group, a nitro group, a heterocyclic group, a halogen atom and an alkylsilyl group of 1 to 20 carbons, or an acid dissociable functional group selected from the group consisting of a substituted methyl group of 2 to 20 carbons, a 1-substituted ethyl group of 3 to 20 carbons, a 1-substituted-n-propyl group of 4 to 20 carbons, a 1-branched alkyl group of 3 to 20 carbons, a silyl group of 1 to 20 carbons, an acyl group of 2 to 20 carbons, a 1-substituted alkoxyalkyl group of 2 to 20 carbons, a cyclic ether group of 2 to 20 carbons, alkoxycarbonyl group of 2 to 20 carbons and an alkoxycarbonylalky group, m is an integer of 1 to 4, provided that the compound (A) has at least one phenolic hydroxyl group or carboxyl group)
• AB)q (3)
• (In the formula (3), A is an aliphatic hydrocarbon group of 1 to 18 carbons, an alicyclic hydrocarbon group of 3 to 18 carbons or an aromatic hydrocarbon group of 6 to 24 carbons, B is an acid crosslinkable reactive group, and q is an integer of 2 to 4).