Extreme ultraviolet light source apparatus
AssigneeGigaphoton Inc.
InventorsYukio Watanabe, Osamu Wakabayashi, Miwa Igarashi
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Abstract
An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.
Claims5
An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light, said apparatus comprising:
- a chamber in which the extreme ultraviolet light to be supplied to said processing unit is generated;
- a collector mirror provided in said chamber, and configured to collect the extreme ultraviolet light generated in said chamber and to output the extreme ultraviolet light from said chamber;
- and
- an optical path connection module arranged at a position between said chamber and said processing unit, and configured to be detachable from the position by detaching said chamber from said processing unit, to isolate a route of the extreme ultraviolet light between said chamber and said processing unit from outside, and to form, in the optical path connection module, an intermediate focusing point of the extreme ultraviolet light from said chamber, wherein
- said optical path connection module includes a wave-shaped section formed on an inner wall of said optical path connection module.
Dependencies are inferred from the claim text.