Electrochemical device including amorphous metal oxide
AssigneeFord Global Technologies, LLC
InventorsJun Yang, Patrick Pietrasz, Chunchuan Xu, Richard E. Soltis, Mark S. Sulek, Robert F. Novak
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Abstract
In one or more embodiments, an electrochemical device includes a substrate having a substrate surface; an amorphous metal oxide layer supported on the substrate surface; and a noble metal catalyst supported on the amorphous metal oxide layer to form a catalyst layer. The amorphous metal oxide layer may contact only 25 to 75 percent of the substrate surface. The amorphous metal oxide layer may include less than 10 weight percent of crystalline metal oxide. In certain instances, the amorphous metal oxide layer is substantially free of crystalline metal oxide.
Claims20
A method comprising:
- forming an amorphous metal oxide (MOx) layer on a substrate having a substrate surface, via sputtering with a source of MOy and a source of an inert gas separately provided from the source of MOy, y is of a value same as or different from x;
- and
- depositing a Pt catalyst to form a two dimensional percolated network supported on the amorphous metal oxide layer.
A method comprising:
- forming an amorphous metal oxide (MOx) layer on a substrate having a substrate surface at a temperature below a crystallization temperature of the MOx;
- and
- depositing a Pt catalyst to form a two dimensional percolated network supported on the amorphous metal oxide layer.
A method comprising:
- forming an amorphous metal oxide (MOx) layer on a substrate having a substrate surface via sputtering at an oxygen-to-inert gas ratio of 10 to 30 percent by volume;
- and
- depositing a Pt catalyst to form a two dimensional percolated network supported on the amorphous metal oxide layer.
Dependencies are inferred from the claim text.