Variable resistive memory device and method of fabricating the same
AssigneeSK hynix Inc.
InventorKeun Lee
Life of this patent
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Abstract
Provided are a variable resistive memory device and a method of fabricating the same. The variable resistive memory device includes an interlayer insulating film having an opening therein, the opening exposing a surface of a first electrode which is disposed at a bottom of the opening. A variable resistive layer is formed in the opening and a second electrode is formed on the variable resistive layer. The variable resistive layer has a sidewall that is separated from an inner side surface of the opening to define a gap between the sidewall of the variable resistive layer and the inner side surface of the opening.
Claims10
A variable resistive memory device comprising:
- an interlayer insulating film having an opening therein, the opening exposing a surface of a first electrode which is disposed at a bottom of the opening;
- a variable resistive layer formed in the opening;
- and
- a second electrode formed on the variable resistive layer,
- wherein a sidewall of the variable resistive layer is separated from an inner side surface of the opening to define a gap between the sidewall of the variable resistive layer and the inner side surface of the opening.
Dependencies are inferred from the claim text.