Manufacturing method for a micromechanical component and a corresponding micromechanical component
AssigneeRobert Bosch GmbH
InventorChristoph Schelling
Life of this patent
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Abstract
A manufacturing method is described for a micromechanical component and a corresponding micromechanical component. The manufacturing method includes the steps: forming at least one crystallographically modified area in a substrate; forming an etching mask having a mask opening on a main surface of the substrate; and carrying out an etching step using the etching mask, the crystallographically modified area and a surrounding area of the substrate being removed and thus forming a cavern in the substrate.
Claims12
A manufacturing method for a micromechanical component, comprising:
- forming at least one crystallographically modified area in a substrate such that the crystallographically modified area is at least partially amorphous or polycrystalline;
- forming an etching mask having a mask opening on a main surface of the substrate;
- and
- carrying out an etching step using the etching mask such that
- the crystallographically modified area and a surrounding area of the substrate are removed, resulting in a cavern formed in the substrate.
A manufacturing method for a micromechanical component, comprising:
- forming at least one crystallographically modified area in a substrate;
- forming an etching mask having a mask opening on a main surface of the substrate;
- carrying out an etching step using the etching mask;
- and
- removing the crystallographically modified area and a surrounding area of the substrate being removed, resulting in a cavern formed in the substrate;
- wherein the substrate is a monocrystalline (100)-silicon substrate, and wherein, at least in areas, the cavern has a shape of a truncated octahedron having (111)-oriented main surfaces.
Dependencies are inferred from the claim text.