Array substrate, fabricating method thereof, and display device
AssigneesBoe Technology Group Co., Ltd., Hefei Xinsheng Optoelectronics Technology Co., Ltd.
InventorZhenfei Cai
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Abstract
An array substrate and a display device incorporating the array substrate are disclosed. The array substrate includes an alignment mark formed in a source-drain electrode layer, and a detection hole formed in a region in a pixel electrode layer and a passivation layer that corresponds to the alignment mark, such that normal detection of the alignment mark can be carried out by irradiating an electronic beam into the detection hole. The structure of the array substrate reduces the likelihood of detection failures.
Claims11
An array substrate comprising
- a glass substrate,
- a gate and common electrode layer,
- a gate insulation layer,
- an etch barrier layer,
- a source-drain electrode layer,
- a passivation layer, and
- a pixel electrode layer,
- said layers being formed sequentially on the glass substrate,
- wherein an alignment mark is formed in the source-drain electrode layer;
- wherein a first via hole is formed in the gate insulation layer and the etch barrier layer;
- wherein the alignment mark is connected with a common electrode in the gate and common electrode layer through the first via hole;
- and
- wherein a detection hole is formed in a region in the passivation layer and the pixel electrode layer that exposes the alignment mark.
A method of fabricating an array substrate, the method comprising:
- forming a gate and common electrode layer, a gate insulation layer, and an etch barrier layer sequentially on a glass substrate;
- etching the etch barrier layer and the gate insulation layer to form a first via hole;
- forming a source-drain electrode layer on the etch barrier layer and an inner wall of the first via hole;
- forming an alignment mark in the source-drain electrode layer, the alignment mark being connected with a common electrode in the gate and common electrode layer through the first via hole;
- forming a passivation layer;
- forming a pixel electrode layer on the passivation layer;
- and
- etching a region in the pixel electrode layer and the passivation layer that exposes the alignment mark to form a detection hole.
A display device including
- an array substrate, the array substrate comprising
- a glass substrate,
- a gate and common electrode layer,
- a gate insulation layer,
- an etch barrier layer,
- a source-drain electrode layer,
- a passivation layer, and
- a pixel electrode layer,
- said layers being formed sequentially on the glass substrate,
- wherein an alignment mark is formed in the source-drain electrode layer;
- wherein a first via hole is formed in the gate insulation layer and the etch barrier layer;
- wherein the alignment mark is connected with a common electrode in the gate and common electrode layer through the first via hole;
- and
- wherein a detection hole is formed in a region in the passivation layer and the pixel electrode layer that exposes the alignment mark.
Dependencies are inferred from the claim text.