Method for manufacturing silicon substrate having textured structure

A method for manufacturing a silicon substrate having texture structure, said method comprising steps of:

• (A) forming a pattern with a resin-comprising composition on the silicon substrate,
• (B) irradiating an etching gas to the silicon substrate surface other than the pattern portion, and
• (C) processing the silicon substrate irradiated with the etching gas with an alkaline etching liquid to form concave structure under the pattern portion,
• wherein said resin-comprising composition comprises:
• (a) polymerizable monomer having (meth)acrylic group,
• (b) photoinitiator, and
• (c) hydrolysate of akloxysilane,
• wherein said hydrolysate of alkoxysilane is at least one selected from a group consisting of:
• hydrolysate of a mixture of general alkoxysilane having a general formula (2):
• (wherein (R5)s are, same or different, C1-4 alkyl group;
• n is an integer of 1-10) and (meth)acrylic group-containing alkoxysilane having a general formula (3):
• (wherein R6 is hydrogen atom or methyl;
• R7 is C1-10 alkylene, C3-10 cycloalkylene or C3-10 polymethylene;
• R8 is C1-4 alkyl, C3-4 cycloalkyl or C6-12 aryl;
• R9 is C1-4 alkyl or C3-4 cycloalkyl;
• l is an integer of 1-3, m is an integer of 0-2, k is an integer of 1-3 and (l+m+k) is 4;
• in case that respective R6, R7, R8 or R9 is present in plural, each of R6(s), R7(s), R8(s) or R9(s) may be same to or different from each other);
• hydrolysate of the (meth)acrylic group-containing alkoxysilane of the general formula (3);
• and
• hydrolysate of a mixture of the general alcoxysilane of the general formula (2), the (meth)acrylic group-containing alkoxysilane of the general formula (3) and metal alkoxide having a general formula (6):
• M-(OR13)4 (6)
• (wherein M is zirconium or titanium;
• and (R13)s are, same or different, C1-10 alkyl group).