Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiation
AssigneeVeeco ALD Inc.
InventorsSang In Lee, Ilsong Lee, Hyo Seok Yang
Life of this patent
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Abstract
Placing a conductive member between a plasma chamber in a remote plasma reactor and a substrate to shield the substrate from irradiation of undesirable electromagnetic radiation, ions or electrons. The conductive member blocks the electromagnetic radiation, neutralizes ions and absorbs the electrons. Radicals generated in the plasma chambers flows to the substrate despite the placement of the conductive member. In this way, the substrate is exposed to the radicals whereas damages to the substrate due to electromagnetic radiations, ions or electrons are reduced or removed.
Claims19
A method of treating a surface of a substrate or depositing a layer of material on a substrate, comprising:
- injecting a first gas into a plasma chamber of a plasma reactor to generate radicals by plasma;
- injecting the generated radicals into a reaction chamber of the plasma reactor via at least one perforation between the reaction chamber and the plasma chamber;
- shielding the substrate from undesirable irradiation generated in the plasma chamber using an electrically conductive member placed between the at least one perforation and the substrate, the electrically conductive member configured to block straight linear paths between the plasma chamber and the substrate;
- injecting, via a channel formed in the electrically conductive member, a second gas into the reaction chamber;
- and
- injecting the radicals to a portion of the substrate passing the reaction chamber.
A method of treating a surface of a substrate or depositing a layer of material on a substrate, comprising:
- injecting a first gas into a plasma chamber of a plasma reactor to generate radicals by plasma;
- injecting the generated radicals into a reaction chamber of the plasma reactor via at least one perforation between the reaction chamber and the plasma chamber;
- shielding the substrate from undesirable irradiation generated in the plasma chamber using a single electrically conductive rod placed between the at least one perforation and the substrate, the single electrically conductive rod having a curved and smoothed surface and configured to block straight linear paths between the plasma chamber and the substrate;
- and
- injecting the radicals to a portion of the substrate passing the reaction chamber.
Dependencies are inferred from the claim text.