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US 9,177,783 B2Granted
Substituted silacyclopropane precursors and their use for the deposition of silicon-containing films
AssigneeApplied Materials, Inc.
InventorsMark Saly, David Thompson
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Abstract
Provided are silacyclopropane-based compounds and methods of making the same. Also provided are methods of using said compounds in film deposition processes to deposit films comprising silicon. Certain methods comprise exposing a substrate surface to a silacyclopropane-based precursor and a co-reagent in various combinations.
Claims11
A method of depositing a silicon-containing film, the method comprising:
- a. exposing a substrate surface to a silicon precursor having a structure represented by:
- wherein each R, R1 and R2 are independently a negatively charged group or a saturated or unsaturated, linear or branched or cyclic group with 1-8 atoms selected from carbon and nitrogen, R3-6 are each independently a saturated or unsaturated, linear or branched or cyclic group with 1-8 atoms selected from carbon and nitrogen and n ranges from 0 to 6;
- and
- b. exposing the substrate surface to a co-reactant to provide a silicon-containing film.
1 more element
Dependencies are inferred from the claim text.