Structure and method for high performance multi-port inductor

A multi-port inductor structure, comprising:

• a first metal layer;
• a second metal layer disposed underneath the first metal layer;
• a third metal layer disposed underneath the second metal layer;
• a first via layer disposed between the first metal layer and the second metal layer;
• a second via layer disposed between the second metal layer and the third metal layer;
• wherein the first metal layer and second metal layer comprise a plurality of concentric bands, wherein the plurality of concentric bands each have a width that decreases inwardly within the structure, and wherein an interspacing distance between concentric bands increases inwardly within the structure, and wherein an interspacing distance between concentric bands increases inwardly within the structure.

A multi-port inductor structure, comprising:

• a first metal layer comprising a lip portion;
• a second metal layer disposed underneath the first metal layer;
• a third metal layer disposed underneath the second metal layer;
• a first via layer disposed between the first metal layer and the second metal layer;
• a second via layer disposed between the second metal layer and the third metal layer;
• wherein the first metal layer and second metal layer comprise a plurality of concentric bands, wherein the plurality of concentric bands each have a width that decreases inwardly within the structure, and wherein an interspacing distance between concentric bands increases inwardly within the structure, and wherein the second metal layer includes a span connecting an inner concentric band to an outer perimeter, and further comprising:
• a first tap point on the lip portion;
• and
• a second tap point on an intermediate concentric band, and wherein an interspacing distance between concentric bands increases inwardly within the structure.