Component of an EUV or UV lithography apparatus and method for producing it
AssigneeCarl Zeiss SMT GmbH
InventorHin Yiu Anthony Chung
Life of this patent
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Abstract
To improve the bonding of two parts (401, 403) of a component (400) of an EUV or UV lithography apparatus such that the probability of occurrence of additional stress over time in the bonded parts (401, 403) is lessened, a component (400) of an EUV or UV lithography apparatus comprising two parts (401, 403) bonded to each other by adhesive material (405) is proposed, wherein the adhesive material (405) is coated with a protective layer (407) insulating the adhesive material (405) from the surrounding gas environment.
Claims16
A component configured for placement in a gas environment of a lithography apparatus operating with an ultraviolet (UV) or extreme ultraviolet (EUV) wavelength, comprising:
- a first part and a second part bonded to each other by adhesive material,
- wherein the adhesive material is coated with a protective layer insulating the adhesive material from the gas environment of the lithography apparatus, and
- wherein the protective layer is a polymer layer and has an elasticity modulus of less than 10 MPa.
A component configured for placement in a gas environment of a lithography apparatus operating with an ultraviolet (UV) or extreme ultraviolet (EUV) wavelength, comprising:
- a first part and a second part bonded to each other by adhesive material,
- wherein the adhesive material is coated with a protective layer insulating the adhesive material from the gas environment of the lithography apparatus, and,
- wherein the protective layer is a polymer layer and has a permeation coefficient of less than 10−7 cm2/bar·s.
Dependencies are inferred from the claim text.