Lithographic apparatus and device manufacturing method using dose control

A method comprising:

• providing a patterned radiation beam using individually controllable elements, wherein:
• the patterned radiation beam comprises a plurality of pixels, and
• the individually controllable elements comprise a defective element corresponding to a defective pixel in the plurality of pixels;
• and
• projecting the patterned radiation beam onto a target portion of a substrate, wherein the projecting comprises:
• delivering a first radiation dose corresponding to a first pixel of the plurality of pixels to form a white region in the target portion, and
• delivering a second radiation dose corresponding to a second pixel of the plurality of pixels to form a compensating white region in the target portion in order to at least partially compensate for an underexposed region in the target portion, wherein:
• the second radiation dose is twice the first radiation dose;
• the second pixel is adjacent to the defective pixel:
• the compensating white region is adjacent to the underexposed region;
• and
• the underexposed region corresponds to the defective pixel.