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US 9,176,383 B2Granted
Photoresist composition and method of manufacturing thin film transistor substrate using the same
AssigneeSamsung Display Co., Ltd.
InventorsJeong-Won Kim, Ki-Hyun Cho, Kwang-Woo Park, Chul-Won Park, Jin-Ho Ju, Dong-Min Kim, Eun Jeagal
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Abstract
A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.
Claims20
A photoresist composition, comprising:
- a solvent;
- a novolac resin;
- a diazide-based photosensitive compound;
- and
- a surfactant represented by Chemical Formula 1:
- wherein R1 and R2 denote a hydrogen atom or an alkyl group, x is 10-50, and y is 10-50.
3 more elements
Dependencies are inferred from the claim text.