Resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsKoji Ichikawa, Takahiro Yasue, Tatsuro Masuyama
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Abstract
A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
Claims4
A resist composition comprising
- (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, said resin comprising a structural unit derived from a monomer having an acid labile group represented by formula (a1-1), the formula (a1-2), or the formula (a1-5),
- wherein La1 and La2 independently represent *—O— or *—O—(CH2)k1—CO—O—, k1 represents an integer of 1 to 7, * represents a bond to the carbonyl group;
- Ra4 and Ra5 independently represent a hydrogen atom or a methyl group;
- Ra6 and Ra7 independently represent a C1 to C8 alkyl group or a C3 to C10 alicyclic hydrocarbon group;
- m1 represents an integer 0 to 14;
- n1 represents an integer 0 to 10;
- n1′ represents an integer 0 to 3;
- R31 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has a halogen atom;
- L1 represents *—O—, *—S— or *—O—(CH2)k1—CO—O—, k1 represents an integer of 1 to 7, * represents a bond to the carbonyl group (—CO—);
- L2 and L3 independently represent *—O— or *—S—;
- s1 represents an integer of 0 to 4;
- s1′ represents an integer of 0 to 4;
- Z1 represents a single bond or a C1 to C6 alkanediyl group, and one or more —CH2— contained in the alkanediyl group may be replaced by —O— or —CO—,
- (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, wherein the structure is a group represented by the formula (Ba) or a group represented by the formula (Bb);
- wherein R3 represents a C1 to C6 alkyl group having a fluorine atom;
- wherein R4 represents a C1 to C6 alkyl group having a fluorine atom;
- and
- R5 and R6 independently represent a hydrogen atom or a fluorine atom, and
- (C) a compound represented by the formula (I),
- wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom;
- m and n independently represent an integer of 0 to 4.
Dependencies are inferred from the claim text.