Loading patent…
AssigneeInpria Corporation
InventorsJason K. Stowers, Alan J. Telecky, Douglas A. Keszler, Andrew Grenville
Estimating the term…
Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.
An aqueous inorganic patterning precursor solution comprising a mixture of water, metal suboxide cations, polyatomic inorganic anions and radiation sensitive ligands comprising peroxide groups, wherein the solution has a molar concentration ratio of ligands to metal suboxide cations of at least about 2 and wherein the precursor solution is stable with respect to phase separation for at least about 24 hours without additional mixing, wherein the precursor solution has a metal suboxide cation concentration from about 0.01 M to about 1.4 M and a polyatomic anion concentration from 0.75 to 1.5 times the metal suboxide cation concentration.
A method for formation of a radiation sensitive inorganic coating precursor solution, the method comprising:
Dependencies are inferred from the claim text.