Display apparatus incorporating dual-level shutters
AssigneePixtronix, Inc.
InventorsJavier Villarreal, Timothy Brosnihan, Mark B. Andersson
Life of this patent
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Abstract
This disclosure provides systems, methods and apparatus for modulating light to form an image on a display, as well as methods manufacturing such apparatus. The display apparatus includes dual-level shutter assemblies. Each dual-level shutter assembly includes front and rear light obstructing levels positioned adjacent to respective front and rear light blocking layers. The front and rear light blocking layers define apertures providing optical paths from a backlight to the front of the display. The dual-level shutters selectively obstruct these optical paths to generate an image.
Claims21
An apparatus, comprising:
- a first light blocking layer including a first aperture formed therein;
- and
- a shutter suspended over the first light blocking layer, wherein the shutter includes:
- a first sidewall and a second sidewall both oriented substantially normal to the first light blocking layer;
- a proximal light obstructing level coupled to and extending outward from a first end of both the first and second sidewalls located proximate to the first light blocking layer;
- and
- a distal light obstructing level coupled to and extending outward from a second end of both the first and second sidewalls located distal to the first light blocking layer relative to the proximal light obstructing level, wherein a portion of the proximal light obstructing level positioned between the first and second sidewalls is substantially thicker than another portion of the proximal light obstructing level positioned outside of the first and second sidewalls, and the thicker portion of the proximal light obstructing level is at a position in the shutter such that when the shutter is in a closed position, the thicker portion is in alignment with the first aperture defined by the first light blocking layer.
A method for fabricating a display element, comprising:
- depositing and patterning a first layer of sacrificial material over a substrate;
- depositing a first layer of structural material over the patterned first layer of sacrificial material;
- patterning the first layer of structural material to define a proximal light obstructing level of a shutter;
- depositing and patterning a second layer of sacrificial material over the patterned first layer of structural material;
- depositing a second layer of structural material over the patterned second layer of sacrificial material;
- and
- patterning the second layer of structural material to define a distal light obstructing level of the shutter, a first sidewall, and a second sidewall, both the first and second sidewalls oriented substantially normal to substrate, wherein a portion of the proximal light obstructing level positioned between the first and second sidewalls is substantially thicker than another portion of the proximal light obstructing level positioned outside of the first and second sidewalls, and the thicker portion of the proximal light obstructing level is at a position in the shutter such that when the shutter is in a closed position, the thicker portion is in alignment with a first aperture defined by a first light blocking layer.
Dependencies are inferred from the claim text.