System and method for apodization in a semiconductor device inspection system

An inspection system suitable for providing apodization, comprising:

• an illumination source configured to illuminate a surface of a sample disposed on a sample stage;
• a detector configured to detect at least a portion of light emanating from the surface of the sample;
• an optical system including an optical pathway configured to optically couple the illumination source and the detector;
• a serrated aperture assembly disposed along the optical pathway of the optical system and configured as an aperture of the optical system, the serrated aperture assembly including two or more serrated aperture stops, wherein at least some of the two or more serrated aperture stops include a plurality of serration features, at least some of the two or more serrated aperture stops including a serrated pattern having a selected orientation;
• and
• a control system communicatively coupled to the serrated aperture assembly, wherein the control system is configured to selectably apply a selected apodization profile to illumination transmitted along the optical pathway of the optical system by controlling an actuation state of at least one of the two or more serrated aperture stops, the selected apodization profile formed with the at least one of the two or more serrated aperture stops.

An inspection system suitable for providing apodization of illumination, comprising:

• an illumination source configured to illuminate a surface of a sample disposed on a sample stage;
• a detector configured to detect at least a portion of light emanating from the surface of the sample;
• an optical system including an optical pathway configured to optically couple the illumination source and the detector, the optical pathway including an illumination arm and a collection arm;
• a Fourier filter disposed along the optical pathway of the optical system, wherein the Fourier filter includes one or more illumination blocking elements arranged in an array pattern, wherein the one or more illumination blocking elements are arranged to block a portion of illumination from the sample, wherein one or more edge regions of the illumination blocking elements have a graduated transmission function, wherein a locally averaged transmission function of the Fourier filter is an apodizing function.