Method for detecting an etching residue

Abstract

The embodiments of the present invention provide a method for detecting an etching residue and relate to the field of display technologies, with the purpose of detecting an etching residue so as to improve product yield. The method comprises: fitting the boundary of a pattern in a position to be detected by film color difference, and positioning the pattern in a position to be detected, thereby acquiring the pattern in a position to be detected; testing an infrared spectrum of the pattern in a position to be detected, and obtaining an infrared spectrogram; determining whether the residue exists according to the infrared spectrogram. The method of the invention may be applicable for the detection of an etching residue during the process of preparing an array substrate or a cell substrate.

Dependencies are inferred from the claim text.