Apparatus for delivering precursor gases to an epitaxial growth substrate

An injector apparatus for distributing gaseous precursors into an epitaxial growth chamber comprising:

• two or more planar materials arranged horizontally within the growth chamber, at least one of the two or more planar materials having at least three channels formed therein, the two or more planar materials being sealingly bonded together so as to seal the at least three channels thereby forming at least three conduits, each of the at least three conduits having a plurality of ports passing through at least one of the two or more planar materials;
• and
• wherein:
• each of the at least three conduits extends horizontally into the epitaxial growth chamber from a proximal portion adjacent to a chamber sidewall to a distal portion in the vicinity of and adjacent to an epitaxial growth substrate present within the chamber;
• each of the at least three conduits has the proximal portion adjacent to the chamber sidewall and bearing at least one opening for receiving a flow of gas;
• each of the at least three conduits having the distal portion in the vicinity of the epitaxial growth substrate and bearing the plurality of ports for distributing the flow of gas into the epitaxial growth chamber;
• the plurality of ports in the distal portion of each of the at least three conduits is arranged to distribute the gas onto at least a portion of a face of the epitaxial growth substrate;
• the at least three distal portions of the at least three conduits are configured into linear shapes that are arranged parallel to each other or into at least partially circular shapes that are arranged concentrically to each other;
• and
• a first conduit, a second conduit and a third conduit are provided by the at least three conduits, each of which has the plurality of ports so as to provide a curtain of third gas from the third conduit between a first gas from the first conduit and a second gas from the second conduit.