System for multi-region processing
AssigneeIntermolecular, Inc.
InventorsPeter Satitpunwaycha, Kent Child
Life of this patent
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Abstract
A gas distribution structure for supplying reactant gases and purge gases to independent process cells to deposit thin films on separate regions of a substrate is described. Each process cell has an associated ring purge and exhaust manifold to prevent reactive gases from forming deposits on the surface of the wafer between the isolated regions. Each process cell has an associated showerhead for conveying the reactive gases to the substrate. The showerheads can be independently rotated to simulate the rotation parameter for the deposition process.
Claims20
A process chamber for processing individual regions on a substrate in a combinatorial manner, the process chamber comprising:
- an induction coil;
- a susceptor disposed on the induction coil,
- wherein a substrate is held on the susceptor and the susceptor is smaller relative to a size of the substrate,
- wherein the substrate is divided into a plurality of individual regions;
- and
- a gas distribution structure disposed over the substrate, the gas distribution structure comprising
- a curtain purge zone,
- an interstitial purge zone, and
- a plurality of process cells,
- wherein each process cell of the plurality of process cells is independent relative to each other and corresponds to a different individual region of the plurality of individual regions of the substrate,
- wherein the each process cell is spaced within the interstitial purge zone and comprises a showerhead disposed over the interstitial purge zone,
- wherein a first set of cylindrical purge gas delivery conduits convey purge gas to the interstitial purge zone for preventing reactants from depositing thin film material in portions of the substrate outside of an area comprising the plurality of process cells,
- wherein a second set of cylindrical purge gas delivery conduits deliver purge gas to the curtain purge zone, the curtain purge zone comprising a ring purge at a periphery of the each process cell,
- wherein the each process cell further comprises an exhaust manifold situated between an outer edge of the showerhead and the ring purge.
Dependencies are inferred from the claim text.