Dispersions of submicron doped silicon particles
AssigneeNanoGram Corporation
InventorNobuyuki Kambe
Life of this patent
Estimating the term…
Abstract
Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
Claims3
A dispersion comprising phosphorous doped silicon nanoparticles, elemental metal nanoparticles and a solvent, wherein the doped silicon nanoparticles and the metal nanoparticles independently have an average primary particle size of about 2 nm to about 100 nm and wherein at least about 95 percent of the silicon nanoparticles have a size that is greater than about 40 percent of the average primary particle size and that is less than about 200 percent of the average primary particle size.
Dependencies are inferred from the claim text.