Molybdenum allyl complexes and use thereof in thin film deposition
AssigneeSigma-Aldrich Co.
InventorsRajesh Odedra, Shaun Garratt, Mark Saly, Ravi Kanjolia
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Abstract
Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R1, R3, R5, R7, R8 and R10 are independently and at each occurrence alkyl; R2, R6 and R9 are independently alkyl; R4 and R11 are independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl; x, z, a, c, d and f are independently zero, 1, or 2; y, b and e are independently zero or 1; and n and m are independently zero to 5.
Claims7
An organometallic complex corresponding in structure to Formula I:
- wherein
- R1 and R3 are independently and at each occurrence alkyl;
- R2 is alkyl;
- R4 is independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl;
- x and z are independently zero, 1, or 2;
- y is zero or 1;
- and
- n is 1 to 4;
- wherein
- when n is 1, R1 or R3, if present, is C2-C8-alkyl.
Dependencies are inferred from the claim text.