Substrate treating apparatus using horizontal treatment cell arrangements with parallel treatment lines

A substrate treating apparatus comprising:

• a first treating block arranged horizontally adjacent to a second treating block;
• each treating block having an upper story and a lower story;
• each treating block including a plurality of cells arranged vertically with an upper cell arranged on the upper story directly above a lower cell arranged on the lower story, a first cell is located on the upper story of the first treating block and a second cell is located on the upper story of the second treating block;
• a third cell is located on the lower story of the first treating block and a fourth cell is located on the lower story of the second treating block;
• said first cell is directly above said third cell, said second cell is located directly above said fourth cell;
• each cell comprising
• treating units for treating substrates;
• and
• a single main transport mechanism disposed in a transporting space of each cell;
• said single transport mechanism transports the substrates to the treating units;
• said single main transport includes a horizontal guide rail slidably attached to two vertical guide rails, the single main transport mechanism includes a base slidably attached to the horizontal guide rail, each single main transport mechanism is confined to one cell,
• wherein the treating units include solution treating units for treating the substrates with solutions, and heat-treating units for heat-treating the substrates;
• the heat-treating units include cooling units for cooling the substrates;
• the transporting space has a belt shape and extends through a center of each cell in plan view;
• all the solution treating units are arranged at a first side of the transporting space;
• all the heating-treating units are arranged at a second side of the transporting space;
• the first side and the second side of the transporting space are opposed to each other;
• the single main transport mechanism is located on the first side of the transporting space;
• the first cell of the first treating block is juxtaposed horizontally and connected to the second cell of the second treating block to form an upper substrate treatment line;
• the third cell of the first treating block is juxtaposed horizontally and connected to the fourth cell of the second treating block to form a lower substrate treatment line;
• the single main transport mechanism and the treating units are in a same layout in plan view for the lower cell and the upper cell directly above the lower cell of each treating block;
• the solution treating units are in a same layout in side view for the lower cell and the upper cell directly above the lower cell of each treating block;
• the heat-treating units are in a same layout in side view for the lower cell and the upper cell directly above the lower cell of each treating block;
• treating units in the lower cell and the upper cell directly above the lower cell of each treating block are configured to perform same treatments on the substrates.