Back to results
US 9,168,680 B2Granted
Apparatus for nano structure fabrication
AssigneeKorea University Research and Business Foundation
InventorKwangyeol Lee
Life of this patent
Estimating the term…
Abstract
One or more techniques for nano structure fabrication are provided. In an embodiment, an apparatus for manufacturing a nano structure is disclosed. The apparatus includes a stamp having a line pattern on a surface thereof that comprises a plurality of protrusions, a die configured to hold a substrate thereon, and a mechanical processing unit configured to press the plurality of protrusions of the stamp against the substrate with a predetermined pressure so as to form at least one channel pore therebetween.
Claims19
An apparatus for manufacturing a nano structure, comprising:
- a stamp including a line pattern comprising a plurality of protrusions;
- a die configured to hold a substrate thereon having a surface;
- an etchant solution;
- a mechanical processing unit configured to:
- place the plurality of protrusions of the stamp in contact with the surface of the substrate so that a plurality of open channel pores are formed therebetween;
- and
- position an assembly of the stamp and the substrate in the etchant solution so that the etchant solution substantially fills the plurality of open channel pores, wherein the mechanical processing unit includes a securing device configured to retain the stamp and the substrate together while positioned in the etchant solution;
- and
- a pressing unit configured to control a pressure applied to the stamp to press the plurality of protrusions against the surface of the substrate while the etchant solution substantially fills the plurality of open channel pores to control a shape and/or a channel pore size of the plurality of open channel pores.
6 more elements
An apparatus for manufacturing a nano structure, comprising:
- a stamp having a line pattern, the line pattern including a plurality of protrusions;
- a die configured to hold a substrate thereon having a surface;
- an etchant solution;
- a mechanical processing unit configured to:
- place the plurality of protrusions of the stamp in contact with the surface of the substrate so that a plurality of open channel pores are formed therebetween;
- and
- position an assembly of the stamp and the substrate in the etchant solution so that the etchant substantially fills the plurality of open channel pores, thereby forming a plurality of protruded portions in the substrate that substantially corresponds to the line pattern of the stamp, wherein the mechanical processing unit includes a securing device configured to retain the stamp and the substrate together while positioned in the etchant solution;
- a pressing unit configured to control a pressure applied to the stamp to press the plurality of protrusions against the surface of the substrate while the etchant solution substantially fills the plurality of open channel pores to control a shape and/or a channel pore size of the plurality of open channel pores;
- and
- a deposition unit configured to selectively deposit a protective coating layer on the substrate adjacent to at least some of the plurality of protruded portions.
7 more elements
An apparatus for manufacturing a nano structure, comprising:
- a stamp including a line pattern comprising a plurality of protrusions;
- a die configured to hold a substrate thereon having a surface;
- and
- a mechanical processing unit configured to:
- place the plurality of protrusions of the stamp in contact with the surface of the substrate so that a plurality of open channel pores are formed therebetween;
- and
- position an assembly of the stamp and the substrate in an etchant solution so that the etchant solution substantially fills the plurality of open channel pores, wherein the mechanical processing unit includes a securing device configured to retain the stamp and the substrate together while positioned in the etchant solution;
- and
- a pressing unit configured to control a pressure applied to the stamp to press the plurality of protrusions against the surface of the substrate while the etchant solution substantially fills the plurality of open channel pores to control a shape and/or a channel pore size of the plurality of open channel pores.
6 more elements
Dependencies are inferred from the claim text.