User-input functions for data sequences in polishing endpoint detection
AssigneeApplied Materials, Inc.
InventorsHarry Q. Lee, Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek
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AssigneeApplied Materials, Inc.
InventorsHarry Q. Lee, Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek
Estimating the term…
A method of controlling polishing includes receiving user input through a graphical user interface selecting a function, the function including at least one parameter that can be varied, polishing a substrate, monitoring a substrate during polishing with an in-situ monitoring system, generating a sequence of values from measurements from the in-situ monitoring system, fitting the function to the sequence of values, the fitting including determining a value of the at least one parameter that provides a best fit of the function to the sequence of values, determining a projected time at which the function equals a target value, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the projected time.
A method of controlling polishing, comprising:
A computer program product, tangibly embodied in a non-transitory machine readable storage device, comprising instructions to cause a processor to:
A chemical mechanical polishing system, comprising:
Dependencies are inferred from the claim text.