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US 9,168,629 B2Granted
Detecting membrane breakage in a carrier head
AssigneeApplied Materials, Inc.
InventorRonald Vern Schauer
Life of this patent
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Abstract
A chemical mechanical polishing system includes a carrier head having a flexible membrane and a chamber to apply pressure to the flexible membrane, a pressure control unit, a pressure supply line connecting the pressure control unit to the chamber, and a sensor located along the pressure supply line to detect a contaminant in the pressure supply line.
Claims20
A chemical mechanical polishing system, comprising:
- a carrier head having a flexible membrane and a chamber to apply pressure to the flexible membrane;
- a pressure control unit;
- a pressure supply line connecting the pressure control unit to the chamber;
- and
- a sensor located along the pressure supply line to detect a contaminant in the pressure supply line.
2 more elements
Dependencies are inferred from the claim text.