Cleaning processing device for biological implant
AssigneeUshio Denki Kabushiki Kaisha
InventorYoshimasa Ogawa
Life of this patent
Estimating the term…
Loading patent…
AssigneeUshio Denki Kabushiki Kaisha
InventorYoshimasa Ogawa
Estimating the term…
Provided is a cleaning processing device that is for a biological implant and that is capable of quickly eliminating ozone generated by ultraviolet-ray radiation after completion of ultraviolet-ray radiation towards the biological implant. The cleaning processing device for a biological implant performs cleaning processing of the biological implant by means of radiating ultraviolet rays at the surface of the biological implant and by causing ozone to contact the surface of the biological implant, and the cleaning processing device is characterized by being provided with a housing, an ultraviolet-ray radiating lamp that is disposed within the housing and that radiates ultraviolet rays at the biological implant, an ozone-removing filter disposed within the housing, and a fan that introduces the ambient gas within the housing to the ozone-removing filter, and is further characterized by the fan being driven in response to the end of cleaning processing of the biological implant.
A cleaning processing device for a biological implant intended to clean the biological implant by radiating ultraviolet rays to a surface of the biological implant and also causing ozone to come into contact with the surface thereof, the device comprising:
Dependencies are inferred from the claim text.
Drawings are temporarily unavailable. Open the PDF at USPTO
From the US filing history. Foreign family members aren’t listed.
By radiant energy, e.g. UV, laser, light beam or the like: by ultraviolet radiation
Radiation: ultraviolet [UV] radiation
Means to be fixed to the jaw-bone for consolidating natural teeth or
Dental auxiliary appliances: cleaning devices specially adapted for dental instruments
About 5 years 5 months of term left · ends 26 Mar 2032 (estimated)
The present application is a national-stage entry of International Application No. PCT/JP2011/070163 filed on Sep. 5, 2011, and claims the benefit of priority of Japanese Application No. 2010-221828 filed on Sep. 30, 2010.
The present invention relates to a cleaning processing device for a biological implant, which performs a cleaning operation by radiating ultraviolet rays to a biological implant, and causing ozone to make contact with the biological implant.
Dental implants are implanted into the jawbone so as to substitute for lost teeth. Further, in a dental implant surgery, it is important for a dental implant to be sufficiently coupled to the bone (osseointegration). To this end, it has been proposed to remove organic matter from a dental implant by radiating ultraviolet rays onto the dental implant (see, patent document 1).
FIG. 1 is a front view illustrating an internal configuration of a housing of a cleaning processing device for a biological implant according to an embodiment of the present invention;
FIG. 2 is a side view illustrating the internal configuration of the housing of the cleaning processing device for the biological implant according to an embodiment of the present invention;
FIG. 3 is a plan view illustrating an ozone-removing chamber of the cleaning processing device for the biological implant according to an embodiment of the present invention;
FIG. 1 is a front view illustrating an internal configuration of a housing of a cleaning processing device for a biological implant according to an embodiment of the present invention, FIG. 2 is a side view illustrating the internal configuration of the housing of the cleaning processing device for the biological implant according to an embodiment of the present invention, and FIG. 3 is a plan view illustrating an ozone-removing chamber of the cleaning processing device for the biological implant according to an embodiment of the present invention.
The cleaning processing device for the biological implant (hereinafter, simply referred to as a (cleaning processing device)) is intended to clean an implant 1 by radiating ultraviolet rays to a pin-shaped dental implant 1 (hereinafter, simply referred to as an (implant)) and also causing ozone to make contact with the dental implant. In the illustrated embodiment, the implant 1 is a screw type having a threaded portion 2 which has on an end thereof a protrusion 3 in a spiral form.
The cleaning processing device includes a housing 10 that has an entire contour of a rectangular shape, with a door (not shown) provided on a front of the housing. In this housing 10 is provided a processing chamber 11 in which a plurality of implants 1 is disposed. Moreover, above the processing chamber 11 is provided an ozone-removing chamber 12 to remove ozone from the atmospheric gas in the processing chamber 11. The processing chamber 11 and the ozone-removing chamber 12 are partitioned from each other by a partition wall 15. This partition wall 15 is spaced apart from a front sidewall 10a and a rear sidewall 10b of the housing 10, respectively, so that an inlet F1 is defined between the front sidewall 10a of the housing 10 and the partition wall 15 to allow gas to flow from the processing chamber 11 to the ozone-removing chamber 12, and an outlet F2 is defined between the rear sidewall 10b of the housing 10 and the partition wall 15 to allow gas to be discharged from the ozone-removing chamber 12 to the processing chamber 11.