Methods of reducing defects in directed self-assembled structures
AssigneeInternational Business Machines Corporation
InventorsJoy Cheng, Daniel P. Sanders, Melia Tjio
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Abstract
Methods are disclosed for reducing the number of defects in a directed self-assembled structure formed on a guiding pre-pattern (e.g., a chemical pre-pattern) on a substrate. A first layer comprising a first self-assembly material is applied onto the guiding pre-pattern, with the first self-assembly material forming domains whose alignment and orientation are directed by the guiding pre-pattern; as a result, a first self-assembled structure is formed. The first self-assembled structure is washed away, and a second layer comprising a second self-assembly material is then applied. The second self-assembly material forms a second self-assembled structure having fewer defects than the first self-assembled structure.
Claims34
A method of reducing the number of defects in a directed self-assembled structure formed on a guiding pre-pattern on a substrate, the method comprising:
- (a) applying a first layer comprising a first self-assembly material onto the guiding pre-pattern, the first self-assembly material forming domains whose alignment and orientation are directed by the guiding pre-pattern, thereby creating a first self-assembled structure;
- (b) optionally annealing the first self-assembled structure;
- (c) directly following step (b), or if step (b) is not performed then directly following step (a):
- washing away the first self-assembled structure, without removing the guiding pre-pattern;
- and
- (d) after said washing, applying a second layer comprising a second self-assembly material over the substrate, wherein the second layer occupies space previously occupied by the first layer, the second self-assembly material forming a second self-assembled structure having fewer defects than the first self-assembled structure.
A method of reducing the number of defects in a directed self-assembled structure formed on a guiding pre-pattern on a substrate, the method comprising:
- (a) applying a first layer comprising a first self-assembly material onto the guiding pre-pattern, the first self-assembly material forming domains whose alignment and orientation are directed by the guiding pre-pattern, thereby creating a first self-assembled structure;
- (b) optionally annealing the first self-assembled structure;
- (c) directly following step (b), or if step (b) is not performed then directly following step (a):
- washing away the first self-assembled structure, and leaving behind a modified guiding pre-pattern;
- and
- (d) after said washing, applying a second layer comprising a second self-assembly material onto the modified guiding pre-pattern, the second self-assembly material forming domains whose alignment and orientation are directed by the modified guiding pre-pattern, thereby creating a second self-assembled structure having fewer defects than the first self-assembled structure.
Dependencies are inferred from the claim text.