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US 9,156,704 B2Granted
Reactor and method for production of silicon
AssigneeDynatec Engineering AS
InventorsJosef Filtvedt, Werner O. Filtvedt
Life of this patent
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Abstract
Reactor for producing silicon by chemical vapor deposition, the reactor comprising a reactor body that forms a container, at least one inlet for a silicon-bearing gas, at least one outlet, and at least one heating device as a part of or operatively arranged to the reactor, distinctive in that at least one main part of the reactor, which part is exposed for silicon-bearing gas and which part is heated for deposition of silicon on said part, is produced from silicon. Method for operation of the reactor.
Claims7
A reactor for producing silicon by chemical vapor deposition, the reactor comprising:
- a reactor body that forms a container;
- at least one inlet for a silicon-bearing gas;
- at least one outlet;
- a wall made of silicon of at least metallurgical quality;
- and
- at least one heating device as a part of or operatively arranged to the reactor arranged to heat the wall for chemical vapor deposition of solid silicon on an inside of said wall.
3 more elements
Dependencies are inferred from the claim text.