Back to results
US 9,119,464 B2Granted
Brush cleaning system
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsFu-Ming Huang, Liang-Guang Chen, Han-Hsin Kuo, Chi-Ming Tsai, He Hui Peng
Life of this patent
Estimating the term…
Abstract
A brush cleaning system comprising: a plate comprising at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein the plate has a static charge on a surface thereof; and a machine configured to rotate a brush in contact with the static charged surface of the plate.
Claims20
A brush cleaning system comprising:
- a first plate comprising at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein the first plate has a static charge on a surface thereof wherein a, b, x and y are integers;
- and
- a machine configured to rotate a brush in contact with the static charged surface of the first plate.
A brush cleaning system comprising:
- a first plate comprising SixNy, where x and y are integers, having a positive static charge on a surface thereof;
- and
- a machine configured to rotate a brush in contact with the positive static charge surface of the first plate.
A brush cleaning system comprising:
- a first plate comprising at least one of silicon nitride (SixNy) or silicon oxide (SiaOb), wherein a, b, x and y are integers and the first plate has a first static charge on a surface thereof;
- a second plate comprising at least one of silicon nitride or silicon oxide, wherein the second plate has a second static charge on a surface thereof;
- and
- a machine configured to rotate a brush in contact with at least one of the static charged surface of the first plate or the static charged surface of the second plate.
1 more element
Dependencies are inferred from the claim text.