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US 9,117,866 B2Granted
Apparatus and method for calculating a wafer position in a processing chamber under process conditions
AssigneeASM IP Holding B.V.
InventorsDavid Marquardt, John Shugrue
Life of this patent
Estimating the term…
Abstract
An apparatus for processing a wafer including a reaction chamber having a reaction space for processing the wafer, a susceptor positioned within the reaction chamber and having a sidewall, at least one light source positioned outside of the reaction space, at least one window in the reaction chamber, and wherein the at least one light source is directed through the at least one window to contact the sidewall.
Claims28
An apparatus for processing a wafer comprising:
- a reaction chamber having a reaction space for processing the wafer;
- a susceptor positioned within the reaction chamber and having a sidewall;
- at least one light source positioned outside of the reaction space;
- at least one window within a through hole of a sidewall of the reaction chamber;
- and,
- wherein the at least one light source is directed through the at least one window to contact the sidewall, and
- wherein the at least one light source measures a position of the susceptor sidewall when the susceptor is in a first vertical position and a position of a test wafer sidewall when the susceptor is in a second vertical position.
4 more elements
A method of determining a wafer center point comprising the steps of:
- providing a reaction chamber having a reaction space and a sidewall having a through hole with a window therein;
- calibrating at least one light source;
- mounting the at least one light source to the sidewall;
- heating the reaction chamber to a processing temperature;
- activating the at least one light source;
- and,
- calculating a position of a susceptor,
- wherein the at least one light source measures a position of the susceptor sidewall when the susceptor is in a first vertical position and a position of a test wafer sidewall when the susceptor is in a second vertical position.
5 more elements
A laser assembly for a wafer processing tool comprising:
- a laser;
- a mount for securing the laser to an outer sidewall of a reaction chamber;
- and,
- wherein the laser projects through a window within the outer sidewall into the reaction chamber and onto a sidewall of the susceptor to detect a position of a susceptor within the reaction chamber, and
- wherein the laser is used to measure a position of the susceptor sidewall when the susceptor is in a first vertical position and a position of a test wafer sidewall when the susceptor is in a second vertical position.
2 more elements
Dependencies are inferred from the claim text.