Method for cleaning a nozzle of a material deposition system

A method for cleaning a nozzle of a material deposition system configured to deposit material on an electronic substrate, the method comprising:

• performing a deposition operation with a material deposition system configured to position an electronic substrate under a deposition head movable by a gantry, to supply material to a chamber of the deposition head, to extend a piston of the deposition head from the chamber, the deposition head having a needle terminating in a needle orifice, and to push a volume of material out of the chamber by an actuator of the deposition head to form a desired volume of material at the needle orifice that is deposited on the electronic substrate;
• and
• cleaning the needle orifice with air directed to the needle orifice,
• wherein cleaning the needle orifice includes positioning at least two air jets on opposite sides of the needle orifice and producing a pulse of air directed to the needle orifice.