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US 9,073,102 B2Granted
Method for cleansing nanoimprinting molds
AssigneeFUJIFILM Corporation
InventorMasafumi Yoshida
Life of this patent
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Abstract
A method for cleansing a mold of the present invention suppresses generation of damage is a method for cleansing a nanoimprinting mold, in which a mesa type mold is immersed in cleansing fluid and ultrasonic cleansing is performed in a state in which a mold release layer containing a fluorine compound is provided on a patterned region of the mesa type mold.
Claims14
A cleansing method for cleansing a nanoimprinting mold after the nanoimprinting mold is employed to perform nanoimprinting, comprising:
- immersing the nanoimprinting mold in a cleansing fluid in a state in which residue of resist utilizing in nonimprinting is adhered thereto;
- and
- performing ultrasonic cleansing;
- wherein:
- the mold is equipped with a planar support portion, a mesa portion formed on a surface of the support portion at a predetermined height from the surface, the mesa portion having a patterned region in which a fine pattern of protrusions and recesses is formed, and a mold release layer containing a fluorine compound formed in the patterned region along the pattern of protrusions and recesses.
2 more elements
Dependencies are inferred from the claim text.