High-frequency power supply device and ignition voltage selection method
AssigneeKyosan Electric Mfg. Co., Ltd.
InventorsItsuo Yuzurihara, Satoshi Aikawa, Hiroshi Kunitama
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AssigneeKyosan Electric Mfg. Co., Ltd.
InventorsItsuo Yuzurihara, Satoshi Aikawa, Hiroshi Kunitama
Estimating the term…
When RF power is supplied from an RF generator to a load via a power supply unit, (a) the internal impedance of the RF generator is made lower than the characteristic impedance of the power supply unit, and (b) the load-end voltage is increased by selecting the electrical length LE of the power supply unit, which connects between the RF generator and the load to supply RF power, so that the electrical length LE has a predetermined relation with the fundamental wavelength λ of the RF AC. More specifically, the electrical length LE of the power supply unit is selected in such a way that, when the load end, which is the input end of the load, is in an open state, the electrical length LE is (2n−1)·(λ/4)−k·λ≦LE≦(2n−1)·(λ/4)+k·λ (n is an integer, k is {π−2·cos−1(1/K)}/(4π)) with respect to the fundamental wavelength λ of the RF AC.
An RF power supplying device comprising:
An ignition voltage selection method that causes a plasma load to generate a plasma discharge at a load end that is an input end of the plasma load, the ignition voltage selection method performed when an RF generator unit supplies an RF AC to the plasma load via a power supply unit, the ignition voltage selection method comprising the steps of:
Dependencies are inferred from the claim text.