Inorganic oxide thin film and method for preparing the same
AssigneeSamsung Display Co., Ltd.
InventorsDong Chan Kim, Seok Gyu Yoon, Kyu Hwan Hwang, Eung Do Kim, Bo Ra Jung, Dong Kyu Seo, Won Jong Kim, Young Woo Song, Jong Hyuk Lee
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Abstract
A quantum-dots containing multi-component inorganic oxide thin film is provided to include an amorphous inorganic oxide bulk region and a plurality of crystalline inorganic oxide regions, wherein the crystalline inorganic oxide regions are discontinuously formed to be surrounded by the amorphous inorganic oxide of the bulk region.
Claims19
A structure comprising a quantum-dots containing multi-component inorganic oxide thin film, the thin film having an amorphous inorganic oxide bulk region and a plurality of crystalline inorganic oxide regions dispersed in the bulk region,
- wherein the crystalline inorganic oxide regions are discontinuously formed to be each surrounded by the amorphous inorganic oxide of the bulk region.
A method for preparing a quantum-dots containing multi-component inorganic oxide thin film, comprising:
- preparing a mixture of different inorganic oxides where at least one of the inorganic oxides becomes amorphous at a predetermined temperature (Tc) and at least another one of the inorganic oxides becomes crystalline at the predetermined temperature;
- providing the mixture as a solid thin film on a base material;
- and
- forming quantum dots through performing a heat treatment on at least a surface of the thin film at the predetermined temperature (Tc).
Dependencies are inferred from the claim text.