Method to texture a lamina surface within a photovoltaic cell
AssigneeGTAT Corporation
InventorS. Brad Herner
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Abstract
It is advantageous to create texture at the surface of a photovoltaic cell to reduce reflection and increase travel length of light within the cell. A method is disclosed to create texture at the surface of a silicon body by reacting a silicide-forming metal at the surface, where the silicide-silicon interface is non-planar, then stripping the silicide, leaving behind a textured surface. Depending on the metal and the conditions of silicide formation, the resulting surface may be faceted. The peak-to-valley height of this texturing will generally be between about 300 and about 5000 angstroms, which is well-suited for use in photovoltaic cells comprising a thin silicon lamina.
Claims6
A photovoltaic device including an emitter and a base comprising:
- a substantially crystalline semiconductor lamina having a first surface and a second surface opposite the first surface, the second surface being a cleaved surface, the lamina being doped to a first conductivity, and the lamina comprising the base region of the photovoltaic device;
- a receiver element attached to the first surface of the lamina;
- and
- a layer of amorphous silicon disposed directly on the second surface of the lamina, at least a part of the amorphous silicon being heavily doped;
- wherein the heavily doped amorphous silicon comprises the emitter of the photovoltaic device.
Dependencies are inferred from the claim text.