Semiconductor device and method of making same

A semiconductor device comprising:

• a semiconductor body;
• a gate electrode disposed over the semiconductor body, the gate electrode having a first length extending between a first edge and a second edge;
• a gate dielectric between the gate electrode and the semiconductor body, the gate dielectric having a second length extending between a first edge and second edge of said gate dielectric and wherein said second length is greater than the first length, wherein the gate dielectric comprise a trapezoidal shape such that a top surface area of the gate dielectric adjacent the gate electrode is smaller than an opposite bottom surface area of the gate dielectric adjacent the semiconductor body;
• a first heavily doped source/drain region disposed within the semiconductor body, the first heavily doped source/drain region extending towards said gate dielectric and up to said first edge of the gate electrode, wherein a portion of the first heavily doped source/drain region is disposed under the gate dielectric;
• and
• a second heavily doped source/drain region disposed within the semiconductor body, the second heavily doped source/drain region extending up to said second edge of the gate electrode such that the second heavily doped source/drain region is spaced from the first heavily doped source/drain region by a channel region that underlies the gate dielectric and the gate electrode, wherein a portion of the second heavily doped source/drain region is disposed under the gate dielectric.