Method for fabricating array substrate and fabrication apparatus used therefor
AssigneeSamsung Display Co., Ltd.
InventorsSangwon Shin, Hyunju Kang, Sangwoo Sohn, Sukyoung Yang, Changoh Jeong
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AssigneeSamsung Display Co., Ltd.
InventorsSangwon Shin, Hyunju Kang, Sangwoo Sohn, Sukyoung Yang, Changoh Jeong
Estimating the term…
Provided is a method for fabricating an array substrate. The method for fabricating the array substrate includes forming a semiconductor layer on a substrate, forming a gate electrode which is insulated from the semiconductor layer, forming source and drain electrodes which are insulated from the gate electrode and connected to the semiconductor layer, and forming a pixel electrode connected to the drain electrode. Here, at least one of the forming of the gate electrode, the forming of the source and drain electrodes, and the forming of the pixel electrode includes forming a conductive layer on the substrate, cooling the substrate on which the conductive layer is formed to a temperature of no greater than about 0° C., heating the cooled substrate, and patterning the conductive layer.
An apparatus for fabricating an array substrate, the apparatus comprising:
Dependencies are inferred from the claim text.