Semiconductor device having low dielectric insulating film and manufacturing method of the same

A semiconductor device comprising:

• a semiconductor substrate including an upper surface having a peripheral edge, a first area and a peripheral second area located between the peripheral edge and the first area, the semiconductor substrate including a plurality of active semiconductor elements;
• a low dielectric film wiring line laminated structure portion which is provided on the first area of the semiconductor substrate, and which has a laminated structure including a plurality of low dielectric films and a plurality of wiring lines, each of the low dielectric films having a relative dielectric constant of 3.0 or lower;
• a passivation film made of an inorganic material and formed on an upper surface of the low dielectric film wiring line laminated structure portion;
• and
• an organic resin film including an upper portion which covers an upper surface of the passivation film, and a side peripheral portion raised on the peripheral second area of the semiconductor substrate, which covers a side peripheral surface of the passivation film and a side peripheral surface of the low dielectric film wiring line laminated structure portion, the organic resin film protecting low dielectric films of the low dielectric film wiring line laminated structure portion from peeling off from the wiring lines thereof,
• wherein the low dielectric films of the low dielectric film wiring line laminated structure portion, the passivation film and the upper portion of the organic resin film respectively include a plurality of through openings for an electric connection of the active semiconductor elements.