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US 9,070,612 B2Granted
Method for fabricating optical micro structure and applications thereof
AssigneeUnited Microelectronics Corp.
InventorCheng-Hung Yu
Life of this patent
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Abstract
A method for fabricating an image sensor, wherein the method comprises steps as follows: Firstly, a transparent substrate is formed on a working substrate. Pluralities of micro lens are formed in the transparent substrate, wherein the lenses have a refraction ratio differing from that of the transparent substrate. Subsequently, a color filter is formed on the lenses. Afterward, the color filter is engaged with an image sensing device by flipping around the working substrate.
Claims6
A method for fabricating an image sensor, comprising:
- forming a transparent substrate on a working substrate;
- forming a plurality of lenses in the transparent substrate, wherein each lens is a micro lens, and the lenses have a refraction ratio differing from that of the transparent substrate;
- forming a color filter on the lenses;
- flipping the working substrate over so as to engage the color filter with an image sensing device;
- and
- planarizing the working substrate, whereby the remaining working substrate serves as a passive layer to protect the color filter, after the color filter is engaged with the image sensing device.
3 more elements
Dependencies are inferred from the claim text.