Interferometer module
AssigneeMapper Lithography IP B.V.
InventorsGuido de Boer, Thomas Adrian Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
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AssigneeMapper Lithography IP B.V.
InventorsGuido de Boer, Thomas Adrian Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
Estimating the term…
The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.
Interferometer module adapted for emitting a measurement beam and an associated reference beam towards a respective measurement mirror and reference mirror, said interferometer module comprising:
Method of determining a displacement of a measurement mirror relative to a reference mirror using an interferometer module adapted for emitting a measurement beam and an associated reference beam towards a respective measurement mirror and reference mirror, said interferometer module comprising:
Dependencies are inferred from the claim text.