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US 9,069,259 B2Granted
Dynamic multi-purpose compositions for the removal of photoresists and method for its use
AssigneeDynaloy, LLC
InventorsMichael Phenis, Laurl Johnson, Raymond Chan, Diane Scheele, Kimberly Pollard
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Abstract
Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, a secondary solvent, and less than about 3 wt. % water. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
Claims15
A stripper solution for removing a photoresist from a substrate comprising
- i) dimethyl sulfoxide,
- ii) a quaternary ammonium hydroxide, and
- iii) an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to different carbon atoms,
- iv) water present in an amount of less than 3 wt %;
- v) and a secondary solvent comprising a glycol compound or a glycol ether compound.
2 more elements
Dependencies are inferred from the claim text.