Scanning exposure apparatus using a plurality of microlens arrays with adjustable inclination
AssigneeV Technology Co., Ltd.
InventorMichinobu Mizumura
Life of this patent
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Abstract
A scanning exposure apparatus using microlens arrays, includes a plurality of microlens arrays is arrayed in a direction perpendicular to a scanning direction above a substrate to be exposed, and the microlens arrays are supported on a support substrate. The microlens arrays can be supported on a support substrate so as to be capable of being inclined from a direction parallel to the exposure substrate, relative to the direction in which the microlens arrays are arranged. The inclination angles of these microlens arrays are configured so as to gradually increase or decrease along the arrangement direction.
Claims7
A scanning exposure apparatus using microlens arrays, the scanning exposure apparatus comprising:
- a plurality of microlens arrays arranged above a substrate to be exposed and comprising microlenses in a two-dimensional arrangement;
- a mask arranged above the microlens arrays and comprising predetermined exposure patterns formed therein;
- an exposure light source for radiating exposure light onto the mask;
- and
- a movement device for moving said microlens arrays and said substrate and mask relative to each other in one direction,
- said plurality of microlens arrays being arranged on a support substrate in a direction perpendicular to said one direction, and each of the microlens arrays being supported so as to be capable of, in use, being inclined relative to said support substrate via an inclination on a plane perpendicular to said one direction.
Dependencies are inferred from the claim text.