Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these

An actinic ray-sensitive or radiation-sensitive resin composition containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the following formula (Z1):

• in formula (Z1),
• L1 represents —O—, —S—, —OS(═O)2—, —S(═O)2O—, —OC(═O)—, —C(═O)O—, —S(═O)—, —S(═O)2—, —C(═O)—, —N(R7)C(═O)—, —C(═O)N(R7)—, —N(R7)S(═O)2— or —S(═O)2N(R7)— (in all of these, the right side is the R1 side), wherein R7 represents a hydrogen atom, an alkyl group or a cycloalkyl group;
• R1 represents an alkylene group, a cycloalkylene group, an arylene group or a divalent group formed by the combination thereof, and —O—, —C(═O)—, —S(═O)2— or —S— may be inserted between the groups;
• A1 represents —SO3−, —SO2N−SO2R8 or —SO2C−(SO2R9)2, wherein R8 represents an alkyl group, a cycloalkyl group or an aryl group, R9 represents an alkyl group, a cycloalkyl group or an aryl group, and two R9 may be the same or different;
• each of R2 and R3 independently represents an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group or a heterocyclic group;
• R4 represents a monovalent substituent, n1 represents an integer of 0 to 4, and when n1 is 2 or more, each R4 may be the same as or different from every other R4;
• and
• R2 and R3, R2 and R4, R3 and R4, R2 and the benzene ring in formula (Z1), R3 and the benzene ring, or R4 and R4 when n1 is 2 or more, may combine with each other to form a ring, provided that with respect to the benzene ring in formula (Z1), when -L1-R1-A1 is substituted at the para-position relative to sulfonium (S+), L1 is not an oxygen atom (—O—).