US 9,069,133 B2 · Anti-reflective coating for photolithography and methods of preparation thereof

Abstract

Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.

Claims20

Dependent claims

An absorbing composition formed from the constituents consisting of:

tetraethoxysilane (TEOS);
methyltriethoxysilane (MTEOS);
at least one incorporatable absorbing compound, wherein the incorporatable absorbing compound comprises two or more benzene rings;
at least one material modification agent comprising γ-aminopropyltriethoxysilane (APTEOS);
at least one catalyst comprising an acid;
and
at least one solvent.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

10/495,686Filed 12 Nov 2002 · continuation

Priority

10 Jun 1999

Published

US 2014/0227538 A114 Aug 2014

Granted

30 Jun 2015

Term ends

Not estimatedThe source records don’t support an estimate.

Classification20 codes

G02B 5/23
Absorbing filters: photochromic filters
C03C 17/008
With materials of composite character: comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and…
C03C 17/30
With organic material: with silicon-containing compounds
C08G 77/04
Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the…

Family

Application09/330,248Parent of this continuation-in-part · filed 10 Jun 1999

Application09/491,166Parent of this continuation-in-part · filed 26 Jan 2000

Application09/698,883Parent of this continuation-in-part · filed 27 Oct 2000

Application10/001,143Parent of this continuation · filed 15 Nov 2001

US 2014/0227538 A1Pre-grant publication · published 14 Aug 2014

US 6,824,879 B2Parent of this continuation

US 6,268,457 B1Parent of this continuation-in-part

Application10/001,143Parent of this continuation-in-part

US 6,365,765 B1Parent of this continuation-in-part

US 6,506,497 B1Parent of this continuation-in-part

US 2002/0095018 A1Published application

US 9,069,133 B2This patent

From the US filing history. Foreign family members aren’t listed.

Anti-reflective coating for photolithography and methods of preparation thereof

Life of this patent

Anti-reflective coating for photolithography and methods of preparation thereof

Life of this patent

Abstract

Claims20