Back to results
US 9,068,274 B1Granted
Electrochemical etching
AssigneeWD Media, LLC
InventorNorbert Staud
Life of this patent
Estimating the term…
Abstract
Methods to etch a workpiece are described. In one embodiment, a workpiece is disposed within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant. An electric field is generated within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.
Claims15
A method, comprising:
- disposing a workpiece within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant, wherein the composition further comprises an adsorbate comprising 2-benzimidazole proprionic acid;
- and
- generating an electric field within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.
Dependencies are inferred from the claim text.