Etching liquid composition and etching method
AssigneeAdeka Corporation
InventorsYuta Taguchi, Kouta Saitoh
Life of this patent
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Abstract
The etching liquid composition of the present invention contains a ferric ion component; a hydrogen chloride component; and a component that is at least one type of compound selected from the group consisting of a compound represented by general formula (1) below and a straight chain or branched chain alcohol having 1 to 4 carbon atoms: wherein R1 and R3 are each independently a hydrogen atom or a straight chain or branched chain alkyl group having 1 to 4 carbon atoms, R2 is a straight chain or branched chain alkylene group having 1 to 4 carbon atoms, and n is a number between 1 and 3.
Claims16
An etching liquid composition which is used to collectively etch a multilayer film formed of an indium oxide-based coating film and a metal-based coating film characterized in that the etching liquid composition is formed of an aqueous solution that contains:
- (A) a ferric ion component;
- (B) a hydrogen chloride component;
- and
- (C) a component that is at least one type of compound selected from the group consisting of a compound represented by general formula (1) below and a straight chain or branched chain alcohol having 1 to 4 carbon atoms:
- wherein R1 and R3 are each independently a hydrogen atom or a straight chain or branched chain alkyl group having 1 to 4 carbon atoms, R2 is a straight chain or branched chain alkylene group having 1 to 4 carbon atoms, and n is a number between 1 and 3.
Dependencies are inferred from the claim text.