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US 9,067,953 B2Granted
Systems for carbon dioxide and sulfur dioxide removal
AssigneeE. I. Du Pont de Nemours and Company
InventorMark A. Scialdone
Life of this patent
Estimating the term…
Abstract
This invention relates to sulfur based compounds useful in methods of carbon dioxide or sulfur dioxide removal.
Claims4
A composition as represented by the structure of the following Formula IA, Formula IIA, or Formula IIIA:
- wherein
- 4) R1, R2, R3, R4, R5, and R6 are independently selected from the group consisting of:
- i) H,
- ii) halogen,
- iii) —CH3, —C2H5, or C3 to C25 straight-chain, branched or cyclic alkane or alkene, optionally substituted with at least one member selected from the group consisting of Cl, Br, F, I, OH, NH2 and SH;
- iv) —CH3, —C2H5, or C3 to C25 straight-chain, branched or cyclic alkane or alkene comprising one to three heteroatoms selected from the group consisting of O, N, Si and S, and optionally substituted with at least one member selected from the group consisting of Cl, Br, F, I, OH, NH2 and SH;
- v) C6 to C20 unsubstituted aryl, or C6 to C25 unsubstituted heteroaryl having one to three heteroatoms independently selected from the group consisting of O, N, Si and S;
- vi) C6 to C25 substituted aryl, or C6 to C25 substituted heteroaryl having one to three heteroatoms independently selected from the group consisting of O, N, Si and S;
- and wherein said substituted aryl or substituted heteroaryl has one to three substituents independently selected from the group consisting of:
- (A) —CH3, —C2H5, or C3 to C25 straight-chain, branched or cyclic alkane or alkene, optionally substituted with at least one member selected from the group consisting of Cl, Br, F, I, OH, NH2 and SH,
- (B) OH,
- (C) NH2, and
- (D) SH;
- and
- vii) —(CH2)nSi(CH2)mCH3, —(CH2)nSi(CH3)3, or —(CH2)nOSi(CH3)m, where n is independently 1-4 and m is independently 0-4;
- wherein any of R1, R2, R3, R4, R5, and R6 can together form a ring;
- and
- 2) Q is S or C.
15 more elements
Dependencies are inferred from the claim text.