Trap apparatus and substrate processing apparatus

A trap apparatus provided between a chamber to which a gas supply unit for introducing gas to process a substrate is connected and an evacuating unit for evacuating the gas in the chamber, comprising:

• a housing provided with an inlet port to be connected to the chamber, and an exhausting port to be connected to the evacuating unit;
• a cooling trap portion provided in the housing, provided with a first space and configured to cool gas introduced into the first space to be a temperature lower than a temperature at which an unreacted component included in the gas is solidified;
• and
• a rotational portion provided in the housing and including a first channel capable of communicating between the inlet port and the first space, and a second channel capable of communicating between the first space and the exhausting port,
• the rotational portion being configured to form a bypass portion provided with a second space capable of communicating between the inlet port and the exhausting port by separating a space in the housing into the first space and the second space,
• the rotational portion being configured to rotate with respect to the housing so that the first channel, the second channel and the second space rotate with respect to the first space of the cooling trap portion to selectively form
• a first path from the inlet port to the exhausting port via the first channel, the first space and the second channel, and
• a second path from the inlet port to the exhausting port via the second space.