Isocyanurate compound for forming organic anti-reflective layer and composition including same

A composition for forming an organic anti-reflective coating layer, comprising:

• 1 to 5 weight % of an isocyanurate compound for forming an organic anti-reflective coating layer represented by the following Formula 1,
• In Formula 1, R is independently a hydrogen atom or a methyl group, R1 is independently a chain type or ring type saturated or unsaturated hydrocarbyl group of 1 to 15 carbon atoms containing 0 to 6 of hetero atoms, and R2 independently a chain type or ring type saturated or unsaturated hydrocarbyl group of 1 to 15 carbon atoms containing 0 to 15 of hetero atoms, wherein, R1 optionally has at least two bonding parts, and in the case that R1 has at least two bonding parts, the rest parts except R1 of the compounds represented by Formula 1 optionally connect to the R1 to form a polymer structure;
• 0.01 to 0.4 weight % of a crosslinking agent;
• 0.01 to 0.25 weight % of an acid generator;
• and
• a remaining organic solvent.

A method for forming an organic anti-reflective coating layer, comprising the step of:

• coating a composition for forming an organic anti-reflective coating layer on an etching layer, wherein the composition comprises 1 to 5 weight% of an isocyanurate compound for forming an organic anti-reflective coating layer represented by the following Formula 1, 0.01 to 0.4 weight % of a crosslinking agent, 0.01 to 0.25 weight % of an acid generator, and a remaining organic solvent,
• In Formula 1, R is independently a hydrogen atom or a methyl group, R1 is independently a chain type or ring type saturated or unsaturated bydrocarbyl group of 1 to 15 carbon atoms containing 0 to 6 of hetero atoms, and R2 independently a chain type or ring type saturated or unsaturated hydrocarbyl group of 1 to 15 carbon atoms containing 0 to 15 of hetero atoms, wherein, R1optionally has at least two bonding parts, and in the case that R1 has at least two bonding parts, the rest parts except R1 of the compounds represented by Formula 1 optionally connect to the R1 to form a polymer structure;
• and
• crosslinking the composition for forming an organic anti-reflective coating layer coated on the etching layer.